Hybrid Metrology Approach for Filtration Solutions

This technical paper discusses the use of a hybrid metrology approach to develop holistic filtration solutions for semiconductor-grade hydrogen peroxide (H2O2). The study aims to identify and characterize native contaminants in H2O2 and evaluate the effectiveness of various filtration media. The research outlines a two-part experimental design. The first part focuses on identifying contaminants using techniques such as Inductively Coupled Plasma Mass Spectrometry (ICP-MS) and Liquid Particle Counting (LPC). The second part assesses the performance of traditional filtration solutions against these identified contaminants. The findings indicate significant differences in particle counts between samples packaged in different containers, emphasizing the importance of packaging on chemical quality. The paper also presents results from various metrology techniques, revealing insights into the types and concentrations of contaminants present in the H2O2 samples. Overall, the study provides a comprehensive understanding of contamination challenges in semiconductor manufacturing and the necessary filtration solutions.